Scanning transmission imaging in the helium ion microscope using a microchannel plate with a delay line detector

• Eduardo Serralta,
• Nico Klingner,
• Olivier De Castro,
• Michael Mousley,
• Santhana Eswara,
• Serge Duarte Pinto,
• Tom Wirtz and
• Gregor Hlawacek

Beilstein J. Nanotechnol. 2020, 11, 1854–1864, doi:10.3762/bjnano.11.167

• also detect channeling-related contrast on polycrystalline silicon, thallium chloride nanocrystals, and single-crystalline silicon by comparing the signal transmitted at different directions for the same data set. Keywords: bright-field; channeling; dark-field; delay line detector; helium ion

• column, such as the helium ion microscope or other light ion beam methods with high lateral resolution. The system is based on the combination of MCPs and a delay line detector mounted on a movable support so that the experiment geometry can be optimized. The used imaging detector is capable of a random

Hybridization vs decoupling: influence of an h-BN interlayer on the physical properties of a lander-type molecule on Ni(111)

• Maximilian Schaal,
• Takumi Aihara,
• Marco Gruenewald,
• Felix Otto,
• Jari Domke,
• Roman Forker,
• Hiroyuki Yoshida and
• Torsten Fritz

Beilstein J. Nanotechnol. 2020, 11, 1168–1177, doi:10.3762/bjnano.11.101

• -600, Eexcitation = 21.22 eV) radiation, and a SPECS PHOIBOS 150 hemispherical electron analyzer equipped with a 3D delay line detector (SPECS DLD4040-150). The energy resolutions of the UPS and XPS measurements were determined to be approx. 10 meV and approx. 0.55 eV, respectively. For the

Quantum size effects in TiO₂ thin films grown by atomic layer deposition

• Massimo Tallarida,
• Chittaranjan Das and
• Dieter Schmeisser

Beilstein J. Nanotechnol. 2014, 5, 77–82, doi:10.3762/bjnano.5.7

• measured through the drain current on the sample, while PEY (and PES) was measured using a PHOIBOS-150 electron analyzer from Specs GmbH, equipped with a 1D delay line detector. The base pressure of the measurement chamber was 5 × 10−10 mbar. XAS at the Ti-L2,3 edge measured for TiO2 films with thicknesses